New wet cleaning strategies for obtaining highly reliable thin oxides

Keyphrases

• Cleaning Methods 33%
• Cleaning Strategies 100%
• Dominant Role 33%
• Gate Oxide 33%
• Gate Oxide Integrity 33%
• HF Last 33%
• Highly Reliable 100%
• Metal Contaminants 33%
• Metal Contamination 33%
• Si Wafer 33%
• Silicon Substrate 33%
• Silicon Surface 33%
• Surface Defects 33%
• Thin Gate Oxide 33%
• Thin Oxides 100%
• Wet Cleaning 100%

Engineering

• Cleaning Procedure 33%
• Gate Oxide 100%
• Si Wafer 33%
• Silicon Substrate 33%
• Silicon Surface 33%
• Surface Defect 33%