Abstract
An optimization technique based on dynamic programming procedure and a linear electron lens model is proposed. The method is suitable for minimization of electron optical aberrations.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 215-224 |
| Number of pages | 10 |
| Journal | Optik (Jena) |
| Volume | 48 |
| Issue number | 2 |
| State | Published - 1977 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering