Near-field radiative transfer between heavily doped SiGe at elevated temperatures

Z. M. Zhang, E. T. Enikov, T. Makansi

Research output: Contribution to journalArticlepeer-review


SiGe alloys represent an important type of high-temperature semiconductor material for solid-state energy conversion. In the present study, the near-field radiative heat transfer between heavily doped SiGe plates is investigated. A dielectric function model is formulated based on the previously reported room-temperature mobility and temperature-dependent electric resistivity of several silicon-rich alloys with different doping type and concentration. Fluctuational electrodynamics is used to evaluate the near-field noncontact heat transfer coefficient. The variation of the heat transfer coefficient with doping concentration and temperature is explained according to the change in the optical constants and in the spectral distribution of the near-field heat flux.

Original languageEnglish (US)
Article number092702
JournalJournal of Heat Transfer
Issue number9
StatePublished - 2012


  • doped SiGe
  • high temperature
  • nanoscale
  • near field
  • thermal radiation

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


Dive into the research topics of 'Near-field radiative transfer between heavily doped SiGe at elevated temperatures'. Together they form a unique fingerprint.

Cite this