Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

J. R. Wendt; G. A. Vawter; R. E. Smith; M. E. Warren

doi:10.1116/1.588248

Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

J. R. Wendt, G. A. Vawter, R. E. Smith, M. E. Warren

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

The nanofabrication of subwavelength, binary, high efficiency diffractive optical elements has been demonstrated in GaAs using electron beam lithography and reactive-ion-beam etching. A unique design process is used that employs both pulse-width and pulse-position modulation, yielding a more realizable design. The fabrication is aided by constraining the design algorithm to dimensions and aspect ratios that are within the limits of the fabrication capabilities. The design dimensions are biased in the exposed pattern to result in final etched structures typically within 20nm of the design values.

Original language	English (US)
Pages (from-to)	2705-2708
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	13
Issue number	6
DOIs	https://doi.org/10.1116/1.588248
State	Published - Nov 1995
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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abstract = "The nanofabrication of subwavelength, binary, high efficiency diffractive optical elements has been demonstrated in GaAs using electron beam lithography and reactive-ion-beam etching. A unique design process is used that employs both pulse-width and pulse-position modulation, yielding a more realizable design. The fabrication is aided by constraining the design algorithm to dimensions and aspect ratios that are within the limits of the fabrication capabilities. The design dimensions are biased in the exposed pattern to result in final etched structures typically within 20nm of the design values.",

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AB - The nanofabrication of subwavelength, binary, high efficiency diffractive optical elements has been demonstrated in GaAs using electron beam lithography and reactive-ion-beam etching. A unique design process is used that employs both pulse-width and pulse-position modulation, yielding a more realizable design. The fabrication is aided by constraining the design algorithm to dimensions and aspect ratios that are within the limits of the fabrication capabilities. The design dimensions are biased in the exposed pattern to result in final etched structures typically within 20nm of the design values.

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Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

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