The nanofabrication of subwavelength, binary, high efficiency diffractive optical elements has been demonstrated in GaAs using electron beam lithography and reactive-ion-beam etching. A unique design process is used that employs both pulse-width and pulse-position modulation, yielding a more realizable design. The fabrication is aided by constraining the design algorithm to dimensions and aspect ratios that are within the limits of the fabrication capabilities. The design dimensions are biased in the exposed pattern to result in final etched structures typically within 20nm of the design values.
|Number of pages
|Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
|Published - Nov 1995
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering