Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

J. R. Wendt, G. A. Vawter, R. E. Smith, M. E. Warren

Research output: Contribution to journalArticlepeer-review

24 Scopus citations


The nanofabrication of subwavelength, binary, high efficiency diffractive optical elements has been demonstrated in GaAs using electron beam lithography and reactive-ion-beam etching. A unique design process is used that employs both pulse-width and pulse-position modulation, yielding a more realizable design. The fabrication is aided by constraining the design algorithm to dimensions and aspect ratios that are within the limits of the fabrication capabilities. The design dimensions are biased in the exposed pattern to result in final etched structures typically within 20nm of the design values.

Original languageEnglish (US)
Pages (from-to)2705-2708
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
StatePublished - Nov 1995
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs'. Together they form a unique fingerprint.

Cite this