TY - JOUR
T1 - Multiphoton microscopy as a detection tool for photobleaching of EO materials
AU - Shahin, Shiva
AU - Mehravar, Soroush
AU - Gangopadhyay, Palash
AU - Peyghambarian, Nasser
AU - Norwood, Robert A.
AU - Kieu, Khanh
N1 - Publisher Copyright:
© 2014 Optical Society of America.
PY - 2014/12/15
Y1 - 2014/12/15
N2 - Multi-photon microscopy operating at 1550 nm is employed as a rapid characterization tool for studying the photostability of three well-known electro-optical materials. Different nonlinear optical responses such as multi-photon excitation fluoresence, second-, and third-harmonic generation can be used as detection probes to reveal the degradation mechanisms. This technique is rapid, accurate, and can be used to study the photostability of a broad range of materials.
AB - Multi-photon microscopy operating at 1550 nm is employed as a rapid characterization tool for studying the photostability of three well-known electro-optical materials. Different nonlinear optical responses such as multi-photon excitation fluoresence, second-, and third-harmonic generation can be used as detection probes to reveal the degradation mechanisms. This technique is rapid, accurate, and can be used to study the photostability of a broad range of materials.
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U2 - 10.1364/OE.22.030955
DO - 10.1364/OE.22.030955
M3 - Article
AN - SCOPUS:84919608347
SN - 1094-4087
VL - 22
SP - 30955
EP - 30962
JO - Optics Express
JF - Optics Express
IS - 25
ER -