Multiphoton microscopy as a detection tool for photobleaching of EO materials

Shiva Shahin, Soroush Mehravar, Palash Gangopadhyay, Nasser Peyghambarian, Robert A. Norwood, Khanh Kieu

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


Multi-photon microscopy operating at 1550 nm is employed as a rapid characterization tool for studying the photostability of three well-known electro-optical materials. Different nonlinear optical responses such as multi-photon excitation fluoresence, second-, and third-harmonic generation can be used as detection probes to reveal the degradation mechanisms. This technique is rapid, accurate, and can be used to study the photostability of a broad range of materials.

Original languageEnglish (US)
Pages (from-to)30955-30962
Number of pages8
JournalOptics Express
Issue number25
StatePublished - Dec 15 2014

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics


Dive into the research topics of 'Multiphoton microscopy as a detection tool for photobleaching of EO materials'. Together they form a unique fingerprint.

Cite this