Abstract
A new technique for simultaneous multi-angle ellipsometric measurements of anisotropic optical structures such as films used in the display industry is introduced. A very small area on the sample is illuminated with a focused beam which after it interacts with the sample and is polarization analyzed is spread across a CCD. Each pixed collects light from a different angle incident on the sample allowing data collection at numerous incident angles simultaneously. The small but significant polarization aberrations of the microscope objectives provide a significant challenge to accurate measurement A mathematical description of the ellipsometric technique is presented. The optical properties of two biaxial samples, a stretched plastic retarder element used for correcting angle of incident effects in LC displays, and a thin layer of E-type polarizing dried liquid crystal material are measured and maps of the ellipsometric parameters ψ and Δ as a function incident and azimuthal angles are presented. Data from both samples are reduced using an iterative algorithm with a biaxial thin film modeling software package to compute all three principle components of the dielectric tensor as well as it's orientation.
Original language | English (US) |
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Article number | 588808 |
Pages (from-to) | 1-11 |
Number of pages | 11 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 5888 |
DOIs | |
State | Published - 2005 |
Event | Polarization Science and Remote Sensing II - San Diego, CA, United States Duration: Aug 2 2005 → Aug 4 2005 |
Keywords
- Anisotropic materials
- Biaxial films
- Birefringence
- Dichroism
- Dielectric tensor
- Ellipsometry
- Polarization
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering