Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates

Michael L. Free; Dong Y. Ryu; Ravindra Bhide; Andrew Wessman

Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates

Michael L. Free, Dong Y. Ryu, Ravindra Bhide, Andrew Wessman

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Surfactants can enhance the removal of sub-micron particles from critical substrates such as silicon wafers and optical lenses by orders of magnitude. This study shows how the adsorption of surfactant can be used to predict cleaning performance as well as techniques to predict surfactant adsorption as a function of ionic strength and surfactant hydrocarbon chain length.

Original language	English (US)
Title of host publication	Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the (MPMD) of the Minerals, Metals and Materials Society, TMS
Editors	A. Agarwal, N.B. Dahotre, S. Seal, J.J. Moore, C. Blue
Pages	325-344
Number of pages	20
State	Published - 2005
Externally published	Yes
Event	2005 TMS Annual Meeting - San Francisco, CA, United States Duration: Feb 13 2005 → Feb 17 2005

Publication series

Name	Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the(MPMD) of the Minerals, Metals and Materials Society, TMS

Conference

Conference	2005 TMS Annual Meeting
Country/Territory	United States
City	San Francisco, CA
Period	2/13/05 → 2/17/05

Keywords

Microcontamination removal
Sub-micron particle removal
Surfactant

ASJC Scopus subject areas

General Engineering

Cite this

Free, M. L., Ryu, D. Y., Bhide, R., & Wessman, A. (2005). Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates. In A. Agarwal, N. B. Dahotre, S. Seal, J. J. Moore, & C. Blue (Eds.), Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the (MPMD) of the Minerals, Metals and Materials Society, TMS (pp. 325-344). (Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the(MPMD) of the Minerals, Metals and Materials Society, TMS).

Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates. / Free, Michael L.; Ryu, Dong Y.; Bhide, Ravindra et al.
Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the (MPMD) of the Minerals, Metals and Materials Society, TMS. ed. / A. Agarwal; N.B. Dahotre; S. Seal; J.J. Moore; C. Blue. 2005. p. 325-344 (Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the(MPMD) of the Minerals, Metals and Materials Society, TMS).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Free, ML, Ryu, DY, Bhide, R & Wessman, A 2005, Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates. in A Agarwal, NB Dahotre, S Seal, JJ Moore & C Blue (eds), Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the (MPMD) of the Minerals, Metals and Materials Society, TMS. Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the(MPMD) of the Minerals, Metals and Materials Society, TMS, pp. 325-344, 2005 TMS Annual Meeting, San Francisco, CA, United States, 2/13/05.

Free ML, Ryu DY, Bhide R, Wessman A. Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates. In Agarwal A, Dahotre NB, Seal S, Moore JJ, Blue C, editors, Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the (MPMD) of the Minerals, Metals and Materials Society, TMS. 2005. p. 325-344. (Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the(MPMD) of the Minerals, Metals and Materials Society, TMS).

Free, Michael L. ; Ryu, Dong Y. ; Bhide, Ravindra et al. / Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates. Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the (MPMD) of the Minerals, Metals and Materials Society, TMS. editor / A. Agarwal ; N.B. Dahotre ; S. Seal ; J.J. Moore ; C. Blue. 2005. pp. 325-344 (Surface Engineering in Materials Science III - Proceedings of a Symposium sponsored by the Surface Engineering Committee of the(MPMD) of the Minerals, Metals and Materials Society, TMS).

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Modeling the effectiveness of surfactants in sub-micron particle removal from solid substrates

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

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