@inproceedings{d969238cfaf449d0ab068ec861cb3487,
title = "Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits",
abstract = "We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.",
author = "Chris Summitt and Sunglin Wang and Lee Johnson and Melissa Zaverton and Tao Ge and Tom Milster and Yuzuru Takashima",
year = "2014",
doi = "10.1117/12.2045234",
language = "English (US)",
isbn = "9780819498878",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
booktitle = "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII",
note = "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII ; Conference date: 03-02-2014 Through 05-02-2014",
}