Abstract
A new technology to pattern surface charges, either negatively or positively, using a standard photolithography process is introduced. Unlimited flow patterns can be generated under an externally applied electric field by electro-osmotic and electrophoretic driving forces to enable fine control of fluid motion in microfluidic devices. Two basic flows, shear and vortical, have been realized experimentally to demonstrate the tremendous potential of this technology, especially in analytical microsystems for genomics or cell biology.
| Original language | English (US) |
|---|---|
| Pages | 475-478 |
| Number of pages | 4 |
| State | Published - 2002 |
| Externally published | Yes |
| Event | 15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002 - Las Vegas, NV, United States Duration: Jan 20 2002 → Jan 24 2002 |
Other
| Other | 15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002 |
|---|---|
| Country/Territory | United States |
| City | Las Vegas, NV |
| Period | 1/20/02 → 1/24/02 |
ASJC Scopus subject areas
- Control and Systems Engineering
- Mechanical Engineering
- Electrical and Electronic Engineering