Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage

Zhenxing Han; Manish Keswani; Srini Raghavan

doi:10.1109/TSM.2013.2271641

Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage

Zhenxing Han
, Manish Keswani
, Srini Raghavan

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

An investigation of particle removal efficiency and feature damage has been conducted in NH₄ OH/NH₄ HCO₃ cleaning solutions irradiated with megasonic energy. By adjusting the pH of the solution in the range of 8.2-8.5, high particle removal efficiency (PRE) was achieved while feature damage was reduced significantly. The sonoluminescence data collected from NH₄ OH and NH₄ OH/NH₄ HCO ₃ solutions indicate significant suppression of transient cavitation in alkaline solutions containing aqueous CO₂.

Original language	English (US)
Article number	6549164
Pages (from-to)	400-405
Number of pages	6
Journal	IEEE Transactions on Semiconductor Manufacturing
Volume	26
Issue number	3
DOIs	https://doi.org/10.1109/TSM.2013.2271641
State	Published - 2013
Externally published	Yes

Keywords

CO (aq.)
Megasonic cleaning
feature damage
particle removal efficiency (PRE)
sonoluminescence (SL)

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/TSM.2013.2271641

Cite this

@article{022f0094ef234e3192a56c2cfa8d7784,

title = "Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage",

abstract = "An investigation of particle removal efficiency and feature damage has been conducted in NH4 OH/NH4 HCO3 cleaning solutions irradiated with megasonic energy. By adjusting the pH of the solution in the range of 8.2-8.5, high particle removal efficiency (PRE) was achieved while feature damage was reduced significantly. The sonoluminescence data collected from NH4 OH and NH4 OH/NH4 HCO 3 solutions indicate significant suppression of transient cavitation in alkaline solutions containing aqueous CO2.",

keywords = "CO (aq.), Megasonic cleaning, feature damage, particle removal efficiency (PRE), sonoluminescence (SL)",

author = "Zhenxing Han and Manish Keswani and Srini Raghavan",

year = "2013",

doi = "10.1109/TSM.2013.2271641",

language = "English (US)",

volume = "26",

pages = "400--405",

journal = "IEEE Transactions on Semiconductor Manufacturing",

issn = "0894-6507",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "3",

}

TY - JOUR

T1 - Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage

AU - Han, Zhenxing

AU - Keswani, Manish

AU - Raghavan, Srini

PY - 2013

Y1 - 2013

N2 - An investigation of particle removal efficiency and feature damage has been conducted in NH4 OH/NH4 HCO3 cleaning solutions irradiated with megasonic energy. By adjusting the pH of the solution in the range of 8.2-8.5, high particle removal efficiency (PRE) was achieved while feature damage was reduced significantly. The sonoluminescence data collected from NH4 OH and NH4 OH/NH4 HCO 3 solutions indicate significant suppression of transient cavitation in alkaline solutions containing aqueous CO2.

AB - An investigation of particle removal efficiency and feature damage has been conducted in NH4 OH/NH4 HCO3 cleaning solutions irradiated with megasonic energy. By adjusting the pH of the solution in the range of 8.2-8.5, high particle removal efficiency (PRE) was achieved while feature damage was reduced significantly. The sonoluminescence data collected from NH4 OH and NH4 OH/NH4 HCO 3 solutions indicate significant suppression of transient cavitation in alkaline solutions containing aqueous CO2.

KW - CO (aq.)

KW - Megasonic cleaning

KW - feature damage

KW - particle removal efficiency (PRE)

KW - sonoluminescence (SL)

UR - https://www.scopus.com/pages/publications/84881326896

UR - https://www.scopus.com/pages/publications/84881326896#tab=citedBy

U2 - 10.1109/TSM.2013.2271641

DO - 10.1109/TSM.2013.2271641

M3 - Article

AN - SCOPUS:84881326896

SN - 0894-6507

VL - 26

SP - 400

EP - 405

JO - IEEE Transactions on Semiconductor Manufacturing

JF - IEEE Transactions on Semiconductor Manufacturing

IS - 3

M1 - 6549164

ER -

Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this