Mechanisms for synergistic oxidation of organics in ultrapure water systems

Kon Tsu Kin; Farhang Shadman

doi:10.1109/66.827334

Mechanisms for synergistic oxidation of organics in ultrapure water systems

Kon Tsu Kin, Farhang Shadman

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

A mechanistic model is developed for the distribution, oxidation, and removal of organic impurities in typical polishing loops of ultrapure water (UPW) plants. The model is applied to the case of the oxidation of organics by ultraviolet (UV), ozone, and a unique method of adding ozone to the UV unit. The model is validated with direct experimental measurements using various oxidation tests. In particular, the accumulation problem related to the recalcitrant (hard to remove) impurities in the UPW systems with recycle is explained. The model is also used to analyze the dynamic behavior of polishing and reclaim/recycle loops. The results show the potential oscillatory behavior of UPW loops in case of impurity surges. This behavior is important and needs to be prevented to avoid metrology and control problems.

Original language	English (US)
Pages (from-to)	1-9
Number of pages	9
Journal	IEEE Transactions on Semiconductor Manufacturing
Volume	13
Issue number	1
DOIs	https://doi.org/10.1109/66.827334
State	Published - 2000
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

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abstract = "A mechanistic model is developed for the distribution, oxidation, and removal of organic impurities in typical polishing loops of ultrapure water (UPW) plants. The model is applied to the case of the oxidation of organics by ultraviolet (UV), ozone, and a unique method of adding ozone to the UV unit. The model is validated with direct experimental measurements using various oxidation tests. In particular, the accumulation problem related to the recalcitrant (hard to remove) impurities in the UPW systems with recycle is explained. The model is also used to analyze the dynamic behavior of polishing and reclaim/recycle loops. The results show the potential oscillatory behavior of UPW loops in case of impurity surges. This behavior is important and needs to be prevented to avoid metrology and control problems.",

author = "Kin, \{Kon Tsu\} and Farhang Shadman",

note = "Funding Information: Manuscript received June 26, 1998; revised August 23, 1999 .This work was supported in part by the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing and by Sematech.",

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AU - Kin, Kon Tsu

AU - Shadman, Farhang

N1 - Funding Information: Manuscript received June 26, 1998; revised August 23, 1999 .This work was supported in part by the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing and by Sematech.

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N2 - A mechanistic model is developed for the distribution, oxidation, and removal of organic impurities in typical polishing loops of ultrapure water (UPW) plants. The model is applied to the case of the oxidation of organics by ultraviolet (UV), ozone, and a unique method of adding ozone to the UV unit. The model is validated with direct experimental measurements using various oxidation tests. In particular, the accumulation problem related to the recalcitrant (hard to remove) impurities in the UPW systems with recycle is explained. The model is also used to analyze the dynamic behavior of polishing and reclaim/recycle loops. The results show the potential oscillatory behavior of UPW loops in case of impurity surges. This behavior is important and needs to be prevented to avoid metrology and control problems.

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Mechanisms for synergistic oxidation of organics in ultrapure water systems

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