Abstract
The purpose of our study was to determine the zeta potential of positive photoresist particles in a number of aqueous solutions of interest to semiconductor processing. Electrophoretic measurements carried out on unexposed and UV-exposed positive photoresist particles have shown that such particles develop a surface charge in aqueous solutions. The experiments also revealed that the zeta potential of the particles is a function of pH and the oxidation potential of the aqueous system, and that UV-exposed particles are characterized by a slightly lower IEP than are unexposed resist particles.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 35-37, 58 |
| Journal | Microcontamination |
| Volume | 8 |
| Issue number | 3 |
| State | Published - Mar 1990 |
ASJC Scopus subject areas
- Engineering(all)