Abstract
This paper presents a promising new technique for ultrapure water systems that combines ultraviolet radiation and ozone to remove colloidal silica by converting it into dissolved silica. It also discusses the combined used of an on-line dissolved silica monitor and a nonvolatile residue monitor in ultrapure water that gives an overall measurement of both dissolved and colloidal silica in near real time.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 8 |
| Number of pages | 8 |
| Journal | MICRO |
| Volume | 15 |
| Issue number | 5 |
| State | Published - May 1997 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Materials Science
- Condensed Matter Physics
- Electrical and Electronic Engineering