Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

M. Keswani; S. Raghavan; R. Govindarajan; I. Brown

doi:10.1016/j.mee.2013.12.028

Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

M. Keswani, S. Raghavan, R. Govindarajan, I. Brown

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Megasonic irradiation of aqueous solutions produces hydroxyl radicals primarily from dissociation of water under extreme transient cavitation temperature conditions. In the current study, the effect of various sound field (∼1 MHz) and solution parameters on rate of generation of hydroxyl radicals in alkaline cleaning solutions of interest to semiconductor industry has been investigated. These parameters include transducer power density, liquid temperature, nature of dissolved gases, solution pH, and type of alkali. Terephthalic acid based fluorescence spectroscopy technique is used for the measurement of concentration of hydroxyl radicals.

Original language	English (US)
Pages (from-to)	61-65
Number of pages	5
Journal	Microelectronic Engineering
Volume	118
DOIs	https://doi.org/10.1016/j.mee.2013.12.028
State	Published - Apr 25 2014
Externally published	Yes

Keywords

Alkaline solutions
Fluorescence spectroscopy
Hydroxyl radicals
Megasonic irradiation
Terephthalic acid

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2013.12.028

Cite this

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title = "Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves",

abstract = "Megasonic irradiation of aqueous solutions produces hydroxyl radicals primarily from dissociation of water under extreme transient cavitation temperature conditions. In the current study, the effect of various sound field (∼1 MHz) and solution parameters on rate of generation of hydroxyl radicals in alkaline cleaning solutions of interest to semiconductor industry has been investigated. These parameters include transducer power density, liquid temperature, nature of dissolved gases, solution pH, and type of alkali. Terephthalic acid based fluorescence spectroscopy technique is used for the measurement of concentration of hydroxyl radicals.",

keywords = "Alkaline solutions, Fluorescence spectroscopy, Hydroxyl radicals, Megasonic irradiation, Terephthalic acid",

author = "M. Keswani and S. Raghavan and R. Govindarajan and I. Brown",

note = "Funding Information: The authors acknowledge Tokyo Electron Limited for funding this project through Semiconductor Research Corporation. We would also like to thank ProSys for providing the megasonic set up (Megbowl{\textregistered}) used in the experiments. ",

year = "2014",

month = apr,

day = "25",

doi = "10.1016/j.mee.2013.12.028",

language = "English (US)",

volume = "118",

pages = "61--65",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

AU - Keswani, M.

AU - Raghavan, S.

AU - Govindarajan, R.

AU - Brown, I.

N1 - Funding Information: The authors acknowledge Tokyo Electron Limited for funding this project through Semiconductor Research Corporation. We would also like to thank ProSys for providing the megasonic set up (Megbowl®) used in the experiments.

PY - 2014/4/25

Y1 - 2014/4/25

N2 - Megasonic irradiation of aqueous solutions produces hydroxyl radicals primarily from dissociation of water under extreme transient cavitation temperature conditions. In the current study, the effect of various sound field (∼1 MHz) and solution parameters on rate of generation of hydroxyl radicals in alkaline cleaning solutions of interest to semiconductor industry has been investigated. These parameters include transducer power density, liquid temperature, nature of dissolved gases, solution pH, and type of alkali. Terephthalic acid based fluorescence spectroscopy technique is used for the measurement of concentration of hydroxyl radicals.

AB - Megasonic irradiation of aqueous solutions produces hydroxyl radicals primarily from dissociation of water under extreme transient cavitation temperature conditions. In the current study, the effect of various sound field (∼1 MHz) and solution parameters on rate of generation of hydroxyl radicals in alkaline cleaning solutions of interest to semiconductor industry has been investigated. These parameters include transducer power density, liquid temperature, nature of dissolved gases, solution pH, and type of alkali. Terephthalic acid based fluorescence spectroscopy technique is used for the measurement of concentration of hydroxyl radicals.

KW - Alkaline solutions

KW - Fluorescence spectroscopy

KW - Hydroxyl radicals

KW - Megasonic irradiation

KW - Terephthalic acid

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DO - 10.1016/j.mee.2013.12.028

M3 - Article

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SP - 61

EP - 65

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

Abstract

Keywords

ASJC Scopus subject areas

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