Abstract
The adsorption of selected compounds of interest to semiconductor processing onto metallic and semiconductor surfaces has been investigated using a quartz crystal microbalance (QCM) technique. The effect of variables such as solution pH and concentration on adsorption has been characterized. Improvement of the sensitivity of the technique using an electrical bias to the crystal electrode has been explored.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 368-373 |
| Number of pages | 6 |
| Journal | Institute of Environmental Sciences - Proceedings, Annual Technical Meeting |
| State | Published - 1996 |
| Event | Proceedings of the 1996 42nd Annual Technical Meeting of the Institute of Environmental Sciences - Orlando, FL, USA Duration: May 12 1996 → May 16 1996 |
ASJC Scopus subject areas
- Environmental Engineering