@inproceedings{1a217bb840a14bb0b323caf464af5f8c,
title = "Manufacturing High-Q Silicon Nitride Photonic Chips via Silicon Hardmask Etching",
abstract = "We present a robust process for fabricating high-Q, dispersion-engineered Si3N4 photonic chips using amorphous silicon hardmask etching with PECVD SiO2 cladding, achieving an intrinsic quality factor up to ∼ 17.5×106 and an average intrinsic quality factor of ∼ 13×106. We anticipate a further reduction in propagation loss through LPCVD SiO2 cladding.",
keywords = "Amorphous silicon, Claddings, Electro-optical waveguides, Etching, Manufacturing, Photonics, Propagation losses, Q-factor, Silicon nitride",
author = "Shuai Liu and Yuheng Zhang and Zheshen Zhang",
note = "Publisher Copyright: {\textcopyright} Optica Publishing Group 2024, {\textcopyright} 2023 The Author(s); 2024 Conference on Lasers and Electro-Optics, CLEO 2024 ; Conference date: 07-05-2024 Through 10-05-2024",
year = "2024",
doi = "10.1364/cleo_si.2024.sf1m.3",
language = "English (US)",
series = "2024 Conference on Lasers and Electro-Optics, CLEO 2024",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2024 Conference on Lasers and Electro-Optics, CLEO 2024",
}