Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices

Wenzhong Bao, Gang Liu, Zeng Zhao, Hang Zhang, Dong Yan, Aparna Deshpande, Brian LeRoy, Chun Ning Lau

Research output: Contribution to journalArticlepeer-review

77 Scopus citations


We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We demonstrate that devices fabricated by this technique have significantly higher mobility values than those obtained by standard electron beam lithography. To obtain ultra-high mobility devices, we extend this technique to fabricate suspended graphene samples with mobilities as high as 120 000 cm2/(V·s).

Original languageEnglish (US)
Pages (from-to)98-102
Number of pages5
JournalNano Research
Issue number2
StatePublished - Feb 2010
Externally publishedYes


  • Lithography-free
  • Mobility
  • Shadow mask
  • Suspended graphene
  • e-beam evaporation

ASJC Scopus subject areas

  • Materials Science(all)
  • Electrical and Electronic Engineering


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