Abstract
We present the results of large-area (20 cm2) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene-oxygen-hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2158-2160 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 68 |
| Issue number | 15 |
| DOIs | |
| State | Published - 1996 |
| Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)