Large-area diamond deposition in an atmospheric pressure stagnation-flow reactor

D. W. Hahn, C. F. Edwards, K. F. McCarty, R. J. Kee

Research output: Contribution to journalArticlepeer-review


We present the results of large-area (20 cm2) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene-oxygen- hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy.

Original languageEnglish (US)
Pages (from-to)2158
Number of pages1
JournalApplied Physics Letters
StatePublished - 1995
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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