Large-area diamond deposition in an atmospheric pressure stagnation-flow reactor

D. W. Hahn; C. F. Edwards; K. F. McCarty; R. J. Kee

doi:10.1063/1.116014

Large-area diamond deposition in an atmospheric pressure stagnation-flow reactor

D. W. Hahn, C. F. Edwards, K. F. McCarty, R. J. Kee

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

We present the results of large-area (20 cm2) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene-oxygen-hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy.

Original language	English (US)
Pages (from-to)	2158-2160
Number of pages	3
Journal	Applied Physics Letters
Volume	68
Issue number	15
DOIs	https://doi.org/10.1063/1.116014
State	Published - 1996
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.116014

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abstract = "We present the results of large-area (20 cm2) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene-oxygen-hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy.",

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Y1 - 1996

N2 - We present the results of large-area (20 cm2) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene-oxygen-hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy.

AB - We present the results of large-area (20 cm2) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene-oxygen-hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy.

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Large-area diamond deposition in an atmospheric pressure stagnation-flow reactor

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