Ion projection lithography for resistless patterning of thin magnetic films

W. H. Bruenger, M. Torkler, C. Dzionk, B. D. Terris, L. Folks, D. Weller, H. Rothuizen, P. Vettiger, G. Stangl, W. Fallmann

Research output: Contribution to journalConference articlepeer-review

12 Scopus citations


The ion projector at the Fraunhofer Institute in Berlin (manufactured by Ion Microfabrication Systems, IMS, Vienna) has been used to pattern thin magnetic films. Disordering of chemically ordered FePt films by patterned ion irradiation (dose: 1016 He+ ions/cm2; 75 keV) without a resist mask on the sample is demonstrated. Magnetically altered areas have been investigated by magnetic force microscopy. Magnetic islands of 340 nm width could be detected, limited by the size of the open stencil mask holes. The projector is capable of 50 nm resolution which would result in a storage density of 64 Gb/in2. In a second experiment the ion projector has been applied for structured ion milling with Xe+ ions on thin metallic films also without a resist mask. In a polycrystalline Au film 130 nm lines and spaces with a depth of 8 nm could be produced by a dose of 1015Xe+ ions at 75 keV energy.

Original languageEnglish (US)
Pages (from-to)605-608
Number of pages4
JournalMicroelectronic Engineering
Issue number1
StatePublished - Jun 2000
Externally publishedYes
Event25th International Conference on Micro- and Nano-Engineering - Rome, Italy
Duration: Sep 21 1999Sep 23 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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