Ion implantation for figure correction of thin X-ray telescope mirror substrates

Brandon Chalifoux, Graham Wright, Ralf K. Heilmann, Mark L. Schattenburg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations


Figure correction of X-ray telescope mirrors will be critical for future missions that require high angular resolution and large collecting areas. In this paper, we show that ion implantation offers a method of correcting figure errors by imparting sub-surface in-plane stress in a controllable magnitude and location in Schott D-263 glass, Corning Eagle XG glass, and crystalline silicon substrates. In addition, we can in theory achieve nearly exact corrections in Schott D-263 glass, by controlling the direction of the stress. We show that sufficient stress may be applied to Schott D-263 glass to achieve figure correction in mirrors with simulated initial figure errors. We also report on progress of a system that will be capable of correcting conical shell mirror substrates.

Original languageEnglish (US)
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy VII
EditorsGiovanni Pareschi, Stephen L. O'Dell, Giovanni Pareschi, Stephen L. O'Dell
ISBN (Electronic)9781628417692, 9781628417692
StatePublished - 2015
Externally publishedYes
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy VII - San Diego, United States
Duration: Aug 10 2015Aug 13 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceOptics for EUV, X-Ray, and Gamma-Ray Astronomy VII
Country/TerritoryUnited States
CitySan Diego


  • X-ray mirrors
  • figure correction
  • glass
  • ion implantation
  • mismatch strain
  • plane stress
  • silicon

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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