Ion-beam patterning of magnetic films using stencil masks

B. D. Terris, L. Folks, D. Weller, J. E.E. Baglin, A. J. Kellock, H. Rothuizen, P. Vettiger

Research output: Contribution to journalArticlepeer-review

180 Scopus citations

Abstract

Previously, ion-beam irradiation has been shown to locally alter the magnetic properties of thin Co/Pt multilayer films. In this work, we have used ion-beam irradiation through a silicon stencil mask having 1-μm-diam holes to pattern a magnetic film. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter in Co/Pt multilayers. These magnetic structures have been observed by magnetic force microscopy. The patterning technique is demonstrated with mask-sample spacing as large as 0.5 mm. In addition, smaller regions of magnetic contrast, down to 100 nm, were created by using two masks with partially overlapping micrometer holes. Such patterned magnetic films are of interest for application in high-density magnetic recording.

Original languageEnglish (US)
Pages (from-to)403-405
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number3
DOIs
StatePublished - Jul 19 1999
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint

Dive into the research topics of 'Ion-beam patterning of magnetic films using stencil masks'. Together they form a unique fingerprint.

Cite this