Ion-beam patterning of magnetic films using stencil masks

B. D. Terris; L. Folks; D. Weller; J. E.E. Baglin; A. J. Kellock; H. Rothuizen; P. Vettiger

doi:10.1063/1.124389

Ion-beam patterning of magnetic films using stencil masks

B. D. Terris, L. Folks, D. Weller, J. E.E. Baglin, A. J. Kellock, H. Rothuizen, P. Vettiger

Research output: Contribution to journal › Article › peer-review

181 Scopus citations

Abstract

Previously, ion-beam irradiation has been shown to locally alter the magnetic properties of thin Co/Pt multilayer films. In this work, we have used ion-beam irradiation through a silicon stencil mask having 1-μm-diam holes to pattern a magnetic film. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter in Co/Pt multilayers. These magnetic structures have been observed by magnetic force microscopy. The patterning technique is demonstrated with mask-sample spacing as large as 0.5 mm. In addition, smaller regions of magnetic contrast, down to 100 nm, were created by using two masks with partially overlapping micrometer holes. Such patterned magnetic films are of interest for application in high-density magnetic recording.

Original language	English (US)
Pages (from-to)	403-405
Number of pages	3
Journal	Applied Physics Letters
Volume	75
Issue number	3
DOIs	https://doi.org/10.1063/1.124389
State	Published - Jul 19 1999
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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title = "Ion-beam patterning of magnetic films using stencil masks",

abstract = "Previously, ion-beam irradiation has been shown to locally alter the magnetic properties of thin Co/Pt multilayer films. In this work, we have used ion-beam irradiation through a silicon stencil mask having 1-μm-diam holes to pattern a magnetic film. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter in Co/Pt multilayers. These magnetic structures have been observed by magnetic force microscopy. The patterning technique is demonstrated with mask-sample spacing as large as 0.5 mm. In addition, smaller regions of magnetic contrast, down to 100 nm, were created by using two masks with partially overlapping micrometer holes. Such patterned magnetic films are of interest for application in high-density magnetic recording.",

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T1 - Ion-beam patterning of magnetic films using stencil masks

AU - Terris, B. D.

AU - Folks, L.

AU - Weller, D.

AU - Baglin, J. E.E.

AU - Kellock, A. J.

AU - Rothuizen, H.

AU - Vettiger, P.

PY - 1999/7/19

Y1 - 1999/7/19

N2 - Previously, ion-beam irradiation has been shown to locally alter the magnetic properties of thin Co/Pt multilayer films. In this work, we have used ion-beam irradiation through a silicon stencil mask having 1-μm-diam holes to pattern a magnetic film. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter in Co/Pt multilayers. These magnetic structures have been observed by magnetic force microscopy. The patterning technique is demonstrated with mask-sample spacing as large as 0.5 mm. In addition, smaller regions of magnetic contrast, down to 100 nm, were created by using two masks with partially overlapping micrometer holes. Such patterned magnetic films are of interest for application in high-density magnetic recording.

AB - Previously, ion-beam irradiation has been shown to locally alter the magnetic properties of thin Co/Pt multilayer films. In this work, we have used ion-beam irradiation through a silicon stencil mask having 1-μm-diam holes to pattern a magnetic film. Regularly spaced micrometer-sized regions of magnetically altered material have been produced over areas of a square millimeter in Co/Pt multilayers. These magnetic structures have been observed by magnetic force microscopy. The patterning technique is demonstrated with mask-sample spacing as large as 0.5 mm. In addition, smaller regions of magnetic contrast, down to 100 nm, were created by using two masks with partially overlapping micrometer holes. Such patterned magnetic films are of interest for application in high-density magnetic recording.

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Ion-beam patterning of magnetic films using stencil masks

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