@inproceedings{c8ee7b006a104621a0222ef64b5a26f2,
title = "Investigation of sources of metallic contamination by TXRF",
abstract = "In this work we show a number of different applications for the use of TXRF to investigate metallic impurity sources. At first, we show that TXRF is well suited to measure metallic impurities in liquids which can be dried on a Si wafer. Then we show the measurement of the leaching of metallic impurities from polymers. Finally, by using a scrubber, the metallic impurities in gases can be measured and the performance of filters can be investigated.",
author = "S. Verhaverbeke and C. Werkhoven and M. Meuris and Schmidt, {H. F.} and K. Dillenbeck and P. Mertens and M. Heyns and A. Philipossian",
year = "1993",
language = "English (US)",
isbn = "1877862193",
series = "Proceedings, Annual Technical Meeting - Institute of Environmental Sciences",
publisher = "Publ by Inst of Environmental Sciences",
pages = "423--431",
editor = "Anon",
booktitle = "Proceedings, Annual Technical Meeting - Institute of Environmental Sciences",
note = "Proceedings of the 39th Annual Technical Meeting of Institute of Environmental Sciences ; Conference date: 02-05-1993 Through 07-05-1993",
}