Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications

Mingrui Zhao; Anfal Alobeidli; Xi Chen; Petrie Yam; Claudio Zanelli; Sharyl Maraviov; Mona Nagel; Farhang Shadman; Manish Keswani

doi:10.1557/adv.2016.313

Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications

Mingrui Zhao, Anfal Alobeidli, Xi Chen, Petrie Yam, Claudio Zanelli, Sharyl Maraviov, Mona Nagel, Farhang Shadman, Manish Keswani

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Surfactants are commonly used as additives in cleaning formulations during acoustic cleaning of semiconductor surfaces. Since surfactants are surface active, they can affect cavitation characteristics and, therefore, influence cleaning efficiency and damage to the surface. In this work, stable and transient cavitation pressures were characterized in Triton^® X-100 containing aqueous solutions subjected to single frequency and dual-frequency sound fields using acoustic emission measurements. The hydrophone based technique allowed quantitative measurements of the absolute pressure values from stable and transient cavitation fields. The ratio of stable cavitation pressure to transient cavitation pressure under different conditions indicated that surfactants can play an important role in reducing feature damage while maintaining particle removal efficiency. Damage studies conducted on aluminum coated glass samples further confirmed these results.

Original language	English (US)
Pages (from-to)	2255-2260
Number of pages	6
Journal	MRS Advances
Volume	1
Issue number	31
DOIs	https://doi.org/10.1557/adv.2016.313
State	Published - 2016

Keywords

acoustic
defects
particulate

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/adv.2016.313

Cite this

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title = "Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications",

abstract = "Surfactants are commonly used as additives in cleaning formulations during acoustic cleaning of semiconductor surfaces. Since surfactants are surface active, they can affect cavitation characteristics and, therefore, influence cleaning efficiency and damage to the surface. In this work, stable and transient cavitation pressures were characterized in Triton{\textregistered} X-100 containing aqueous solutions subjected to single frequency and dual-frequency sound fields using acoustic emission measurements. The hydrophone based technique allowed quantitative measurements of the absolute pressure values from stable and transient cavitation fields. The ratio of stable cavitation pressure to transient cavitation pressure under different conditions indicated that surfactants can play an important role in reducing feature damage while maintaining particle removal efficiency. Damage studies conducted on aluminum coated glass samples further confirmed these results.",

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T1 - Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications

AU - Zhao, Mingrui

AU - Alobeidli, Anfal

AU - Chen, Xi

AU - Yam, Petrie

AU - Zanelli, Claudio

AU - Maraviov, Sharyl

AU - Nagel, Mona

AU - Shadman, Farhang

AU - Keswani, Manish

PY - 2016

Y1 - 2016

N2 - Surfactants are commonly used as additives in cleaning formulations during acoustic cleaning of semiconductor surfaces. Since surfactants are surface active, they can affect cavitation characteristics and, therefore, influence cleaning efficiency and damage to the surface. In this work, stable and transient cavitation pressures were characterized in Triton® X-100 containing aqueous solutions subjected to single frequency and dual-frequency sound fields using acoustic emission measurements. The hydrophone based technique allowed quantitative measurements of the absolute pressure values from stable and transient cavitation fields. The ratio of stable cavitation pressure to transient cavitation pressure under different conditions indicated that surfactants can play an important role in reducing feature damage while maintaining particle removal efficiency. Damage studies conducted on aluminum coated glass samples further confirmed these results.

AB - Surfactants are commonly used as additives in cleaning formulations during acoustic cleaning of semiconductor surfaces. Since surfactants are surface active, they can affect cavitation characteristics and, therefore, influence cleaning efficiency and damage to the surface. In this work, stable and transient cavitation pressures were characterized in Triton® X-100 containing aqueous solutions subjected to single frequency and dual-frequency sound fields using acoustic emission measurements. The hydrophone based technique allowed quantitative measurements of the absolute pressure values from stable and transient cavitation fields. The ratio of stable cavitation pressure to transient cavitation pressure under different conditions indicated that surfactants can play an important role in reducing feature damage while maintaining particle removal efficiency. Damage studies conducted on aluminum coated glass samples further confirmed these results.

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KW - defects

KW - particulate

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Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications

Abstract

Keywords

ASJC Scopus subject areas

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