@inbook{1ae4efd81cd3473780004bf18e9e405c,
title = "Introduction to Micro-Systems and to the Techniques for Their Fabrication",
abstract = "This chapter presents an introduction to the main manufacturing processes for micro-systems. After a brief historical overview of the field of microsystems, their main manufacturing techniques are reviewed. These include substrate preparation, photolithography, oxidation and diffusion, thin-film deposition, and wet and dry etching techniques. MEMS-specific processes including bulk- and surface-micromachining, LIGA, soft-lithography, and anodic bonding are also presented. The material is illustrated with multiple examples of process parameter calculation. Examples of MEMS devices fabricated in the laboratory of the author are also provided.",
keywords = "Anisotropic Etching, Etch Rate, Junction Depth, Pattern Transfer, Thermal Actuator",
author = "Enikov, {Eniko T.}",
note = "Funding Information: This material is bgised upon the work supported by the National Science Foundation under Grants No. EEC-0407369, DMI-0134585, and DMI-0303868. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily refiect the views of the National Science Foundation. Publisher Copyright: {\textcopyright} 2006, CISM, Udine.",
year = "2006",
doi = "10.1007/978-3-211-48549-1_1",
language = "English (US)",
series = "CISM International Centre for Mechanical Sciences, Courses and Lectures",
publisher = "Springer International Publishing",
pages = "1--36",
booktitle = "CISM International Centre for Mechanical Sciences, Courses and Lectures",
}