Abstract
The interaction of an alkyl polyglycidol surfactant with hydrogen-passivated silicon from dilute hydrofluoric acid solutions has been measured using wettability and attenuated total reflection Fourier transform infrared spectroscopic techniques. The surfactant was found to be very effective in rendering hydrophobic hydrogen-terminated silicon hydrophilic in the hydrofluoric acid solutions. The adsorption of the surfactant, and its desorption when rinsed with deionized water, were very rapid. However, approximately 20% of the adsorbed surfactant remained on the silicon surface even after prolonged rinsing.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2284-2288 |
| Number of pages | 5 |
| Journal | Journal of the Electrochemical Society |
| Volume | 146 |
| Issue number | 6 |
| DOIs | |
| State | Published - Jun 1999 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Electrochemistry
- Materials Chemistry