Influence of Lens and Perspective Distortion on Optical Surface Metrology Instrumentation

Henry Quach, Joel Berkson, Hyukmo Kang, Heejoo Choi, Daewook Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution


For any surface metrology system that obtains measurement with the aid of an imaging system, distortion must be carefully scrutinized. Both intrinsic lens distortion and perspective distortion embed surface error distributions that skew the interpretation of resultant surface maps. Either displaces acquired information due to the imaging process. Here, we quantify the origins of distortion, its modeling philosophy, and the effects of its digital correction procedure. This study includes simulation for lens-distorted systems such as interferometers and perspective-distorted systems such as monoscopic fringe projection profilometry and deflectometry. Summarily, this study hopes to clarify differences in low-order shape between surface metrology instrument measurements in which surface maps were not rectified for distortion.

Original languageEnglish (US)
Title of host publicationOptical Manufacturing and Testing XIV
EditorsDaewook Kim, Heejoo Choi, Heidi Ottevaere, Rolf Rascher
ISBN (Electronic)9781510654266
StatePublished - 2022
EventOptical Manufacturing and Testing XIV 2022 - San Diego, United States
Duration: Aug 22 2022Aug 24 2022

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceOptical Manufacturing and Testing XIV 2022
Country/TerritoryUnited States
CitySan Diego


  • Deflectometry
  • Fringe Projection Profilometry
  • Interferometry
  • Lens Distortion
  • Perspective Distortion

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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