Abstract
Delicate calibration is essential for high-accuracy deflectometric measurements of specular surfaces. However, traditional methods rely on assumptions that can introduce significant systematic errors, particularly regarding system stability throughout the calibration-measurement process. This Letter proposes a synchronized calibration and measurement method for deflectometry, effectively tackling the instability-induced systematic error. Experimental validation emulating in situ measurement scenario with synchronized calibration has been conducted, and the results demonstrate nanometric-level agreement between interferometry and deflectometry. Our method enables nanometric-level, in situ deflectometry, thereby paving a path to high-accuracy optical fabrication and online surface characterization.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 3935-3938 |
| Number of pages | 4 |
| Journal | Optics letters |
| Volume | 50 |
| Issue number | 12 |
| DOIs | |
| State | Published - Jun 15 2025 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics