Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices

Shahab Siddiqui, Min Dai, Rainer Loesing, Erdem Kaltalioglu, Rajan Pandey, Rajesh Sathiyanarayanan, Sandip De, Srini Raghavan, Harold Parks

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