Impact of gaseous additives on copper CMP in neutral and alkaline solutions using a CAP system

Darren Denardis, Toshiro Doi, Brent Hiskey, Koichiro Ichikawa, Daizo Ichikawa, Ara Philipossian

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

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Engineering & Materials Science

Chemical Compounds