Abstract
This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.
| Original language | English (US) |
|---|---|
| Volume | 38 |
| No | 7 |
| Specialist publication | Solid State Technology |
| State | Published - Jul 1995 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry