IMEC clean: A new concept for particle and metal removal on Si surfaces

M. Meuris; P. W. Mertens; A. Opdebeeck; H. F. Schmidt; M. Depas; G. Vereecke; M. M. Heyns; A. Philipossian

IMEC clean: A new concept for particle and metal removal on Si surfaces

M. Meuris, P. W. Mertens, A. Opdebeeck, H. F. Schmidt, M. Depas, G. Vereecke, M. M. Heyns, A. Philipossian

Chemical and Environmental Engineering

Research output: Contribution to specialist publication › Article

64 Scopus citations

Abstract

This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.

Original language	English (US)
Volume	38
No	7
Specialist publication	Solid State Technology
State	Published - Jul 1995

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

Cite this

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title = "IMEC clean: A new concept for particle and metal removal on Si surfaces",

abstract = "This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.",

author = "M. Meuris and Mertens, {P. W.} and A. Opdebeeck and Schmidt, {H. F.} and M. Depas and G. Vereecke and Heyns, {M. M.} and A. Philipossian",

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AU - Meuris, M.

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AU - Opdebeeck, A.

AU - Schmidt, H. F.

AU - Depas, M.

AU - Vereecke, G.

AU - Heyns, M. M.

AU - Philipossian, A.

PY - 1995/7

Y1 - 1995/7

N2 - This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.

AB - This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.

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JO - Solid State Technology

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IMEC clean: A new concept for particle and metal removal on Si surfaces

Abstract

ASJC Scopus subject areas

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