Imaging properties of a patterned rough surface: Effects of defocus

Neil A. Beaudry; Tom D. Milster

doi:10.1117/1.1922947

Imaging properties of a patterned rough surface: Effects of defocus

Neil A. Beaudry, Tom D. Milster

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

A theoretical investigation of the effects of imaging a patterned rough surface through focus is performed, and the statistics of the image plane irradiance, as well as those of the image pattern printed in a threshold-type photoresist, are investigated. It is demonstrated that the line edge roughness in the printed image increases substantially as the image plane is moved out of focus, for both fully and partially coherent optical systems. Furthermore, the increase in line edge roughness occurs in what is considered to be an otherwise acceptable depth of focus for an ideal system.

Original language	English (US)
Pages (from-to)	1-10
Number of pages	10
Journal	Optical Engineering
Volume	44
Issue number	6
DOIs	https://doi.org/10.1117/1.1922947
State	Published - Jun 2005

Keywords

Focus
Imaging
Microlithography
Roughness

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Engineering(all)

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10.1117/1.1922947

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AB - A theoretical investigation of the effects of imaging a patterned rough surface through focus is performed, and the statistics of the image plane irradiance, as well as those of the image pattern printed in a threshold-type photoresist, are investigated. It is demonstrated that the line edge roughness in the printed image increases substantially as the image plane is moved out of focus, for both fully and partially coherent optical systems. Furthermore, the increase in line edge roughness occurs in what is considered to be an otherwise acceptable depth of focus for an ideal system.

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KW - Imaging

KW - Microlithography

KW - Roughness

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Imaging properties of a patterned rough surface: Effects of defocus

Abstract

Keywords

ASJC Scopus subject areas

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