Imaging ellipsometry of optical coatings in situ

Russell A. Chipman, Joseph L. Pezzaniti

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


A Mueller matrix imaging polarimeter has been developed and demonstrated for characterizing the polarization properties of optical coatings in place in optical systems. This Mueller matrix imaging polarimeter is a form of ellipsometer which measures the polarization characteristics of ray paths through systems in image form. It is a highly versatile instrument capable of making a variety of polarimetric measurements on optical samples or entire optical systems. Two data sets will be presented. The first shows the polarization behavior for example lenses which display the typical Maltese cross variation. The second shows images of polarizing beam splitter behavior as a function of angle of incidence, clearly showing how the plane of polarization as determined by the s- and p-planes rotates for light incident out of the normal plane.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Number of pages11
ISBN (Print)0819415863
StatePublished - 1994
EventOptical Thin Films IV: New Developments - San Diego, CA, USA
Duration: Jul 25 1994Jul 27 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherOptical Thin Films IV: New Developments
CitySan Diego, CA, USA

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Imaging ellipsometry of optical coatings in situ'. Together they form a unique fingerprint.

Cite this