Abstract
A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins's image model. The models are scalar models and apply to planar, perfectly conducting mask objects.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 959-967 |
| Number of pages | 9 |
| Journal | Journal of the Optical Society of America A: Optics and Image Science, and Vision |
| Volume | 21 |
| Issue number | 6 |
| DOIs | |
| State | Published - Jun 2004 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Computer Vision and Pattern Recognition