Illumination artifacts in hyper-NA vector imaging

Jun Zhang; Yongsik Kim; Seung Hune Yang; Tom D. Milster

doi:10.1364/JOSAA.27.002272

Illumination artifacts in hyper-NA vector imaging

Jun Zhang, Yongsik Kim, Seung Hune Yang, Tom D. Milster

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Off-axis polarized monopole illumination is applied to a hyper-numerical-aperture (NA) (NA>1) microscopic system. Illumination artifacts due to vector effects are observed, which are asymmetric and depend on illumination conditions. A model based on rigorous coupled wave theory is used to simulate image profiles for dielectric, semiconductor, and metal gratings with different monopole locations and polarization states. A solid immersion lens microscope is used to image different types of samples including MoSi photomask, patterned silicon wafer, and chrome photomask. The experimental images are in good agreement with simulation results.

Original language	English (US)
Pages (from-to)	2272-2284
Number of pages	13
Journal	Journal of the Optical Society of America A: Optics and Image Science, and Vision
Volume	27
Issue number	10
DOIs	https://doi.org/10.1364/JOSAA.27.002272
State	Published - Oct 1 2010

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Computer Vision and Pattern Recognition

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Illumination artifacts in hyper-NA vector imaging

Abstract

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