Hot stage for x-ray diffraction of ceramic systems

T. P. Seward; F. N. Molea; D. R. Uhlmann

doi:10.1063/1.1719479

Hot stage for x-ray diffraction of ceramic systems

T. P. Seward, F. N. Molea, D. R. Uhlmann

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

Original language	English (US)
Pages (from-to)	1851-1852
Number of pages	2
Journal	Review of Scientific Instruments
Volume	36
Issue number	12
DOIs	https://doi.org/10.1063/1.1719479
State	Published - 1965
Externally published	Yes

ASJC Scopus subject areas

Instrumentation

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10.1063/1.1719479

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title = "Hot stage for x-ray diffraction of ceramic systems",

abstract = "A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.",

author = "Seward, {T. P.} and Molea, {F. N.} and Uhlmann, {D. R.}",

year = "1965",

doi = "10.1063/1.1719479",

language = "English (US)",

volume = "36",

pages = "1851--1852",

journal = "Review of Scientific Instruments",

issn = "0034-6748",

publisher = "American Institute of Physics",

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T1 - Hot stage for x-ray diffraction of ceramic systems

AU - Seward, T. P.

AU - Molea, F. N.

AU - Uhlmann, D. R.

PY - 1965

Y1 - 1965

N2 - A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

AB - A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

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U2 - 10.1063/1.1719479

DO - 10.1063/1.1719479

M3 - Article

AN - SCOPUS:0042219336

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VL - 36

SP - 1851

EP - 1852

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

IS - 12

ER -

Hot stage for x-ray diffraction of ceramic systems

Abstract

ASJC Scopus subject areas

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