Metal and metal oxide electrodes have gained lots of interest in many optoelectronic devices including photovoltaics, light emitting diodes, sensors, batteries and biophotonics. In light harvesting devices, one dimensional electrodes increase surface area which in turn enhannces the light absorption, charge transfer and charge collection effieincies. A novel nanoimprint lithography method is used to fabricate nanostructured electrodes (NSEs). Silicon mold is used to imprint nanostructures with different dimensions and geomerties. The polymer film is then cured at ∼ 150 °C to fabricate nanostructures. Large area nanostructured hybrid silver and transparent conductive oxides (TCOs) including ITO and IZO arrays with feature sizes below 100 nm have been fabricated. The optical and electrical properties of these core shell electrodes including the surface plasmon frequency can be tuned by suitably changing the dielectrics and their dimensions. The surface plasmon wavelength of the nanopillar Ag changes from 650nm to 690nm depending on the dimensions of the pillars. Adding layers of ITO to the structure shifts the resonance wavelength toward the infrared region by an amount depending on the sequence and thickness of the layers in the structure.