@inproceedings{ce64a492ed1646c283cb3cf8e1f5e8a1,
title = "High-resolution optical lithography with a near-field scanning subwavelength aperture",
abstract = "We report on a novel method for generating sub-micron lithographic patterns in photoresist through the use of a scanned sub-wavelength optical aperture. The aperture consists of the tip of a single-mode optical fiber that is drawn down to a diameter of 80 nm and coated with aluminum. The fiber tip is manipulated with a modified scanning tunneling microscope (STM) that brings the tip into proximity of a photoresist-coated substrate. The resolution is primarily a function of the aperture diameter and tip-to-sample separation. A linewidth of 200 nm has been achieved in preliminary experiments.",
author = "Froehlich, {Fred F.} and Milster, {Tom D.} and R. Uber",
year = "1993",
doi = "10.1117/12.138895",
language = "English (US)",
isbn = "0819409243",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "Publ by Int Soc for Optical Engineering",
pages = "312--320",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
note = "Miniature and Micro-Optics: Fabrication and System Applications II ; Conference date: 19-07-1992 Through 20-07-1992",
}