High-precision figure correction of x-ray telescope optics using ion implantation

Brandon Chalifoux, Edward Sung, Ralf K. Heilmann, Mark L. Schattenburg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

14 Scopus citations

Abstract

Achieving both high resolution and large collection area in the next generation of x-ray telescopes requires highly accurate shaping of thin mirrors, which is not achievable with current technology. Ion implantation offers a promising method of modifying the shape of mirrors by imparting internal stresses in a substrate, which are a function of the ion species and dose. This technique has the potential for highly deterministic substrate shape correction using a rapid, low cost process. Wafers of silicon and glass (D-263 and BK-7) have been implanted with Si+ ions at 150 keV, and the changes in shape have been measured using a Shack-Hartmann metrology system. We show that a uniform dose over the surface repeatably changes the spherical curvature of the substrates, and we show correction of spherical curvature in wafers. Modeling based on experiments with spherical curvature correction shows that ion implantation could be used to eliminate higher-order shape errors, such as astigmatism and coma, by using a spatially-varying implant dose. We will report on progress in modelling and experimental tests to eliminate higher-order shape errors. In addition, the results of experiments to determine the thermal and temporal stability of implanted substrates will be reported.

Original languageEnglish (US)
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy VI
DOIs
StatePublished - 2013
Externally publishedYes
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy VI - San Diego, CA, United States
Duration: Aug 26 2013Aug 29 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8861
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptics for EUV, X-Ray, and Gamma-Ray Astronomy VI
Country/TerritoryUnited States
CitySan Diego, CA
Period8/26/138/29/13

Keywords

  • ion implantation
  • roughness
  • shape correction
  • stability
  • stress
  • telescope optics
  • x-ray optics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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