High ku materials approach to 100 gbits/in2

D. Weller, A. Moser, L. Folks, M. E. Best, W. Lee, M. F. Toney, M. Schwickert

Research output: Contribution to journalArticlepeer-review

1343 Scopus citations

Fingerprint

Dive into the research topics of 'High ku materials approach to 100 gbits/in2'. Together they form a unique fingerprint.

Engineering

Material Science

Chemical Engineering

Keyphrases