High density lithography using attenuated phase shift mask and negative resist

S. Pau; R. Cirelli; K. Bolan; A. G. Timko; J. Frackoviak; G. P. Watson; L. E. Trimble; J. W. Blatchford; O. Nalamasu

doi:10.1117/12.389015

High density lithography using attenuated phase shift mask and negative resist

S. Pau
, R. Cirelli
, K. Bolan
, A. G. Timko
, J. Frackoviak
, G. P. Watson
, L. E. Trimble
, J. W. Blatchford
, O. Nalamasu

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

Original language	English (US)
Pages (from-to)	266-270
Number of pages	5
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4000 (I)
DOIs	https://doi.org/10.1117/12.389015
State	Published - 2000
Externally published	Yes
Event	Optical Microlithography XIII - Santa Clara, CA, USA Duration: Mar 1 2000 → Mar 3 2000

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.389015

Cite this

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title = "High density lithography using attenuated phase shift mask and negative resist",

abstract = "A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.",

author = "S. Pau and R. Cirelli and K. Bolan and Timko, \{A. G.\} and J. Frackoviak and Watson, \{G. P.\} and Trimble, \{L. E.\} and Blatchford, \{J. W.\} and O. Nalamasu",

year = "2000",

doi = "10.1117/12.389015",

language = "English (US)",

volume = "4000 (I)",

pages = "266--270",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Optical Microlithography XIII ; Conference date: 01-03-2000 Through 03-03-2000",

}

TY - JOUR

T1 - High density lithography using attenuated phase shift mask and negative resist

AU - Pau, S.

AU - Cirelli, R.

AU - Bolan, K.

AU - Timko, A. G.

AU - Frackoviak, J.

AU - Watson, G. P.

AU - Trimble, L. E.

AU - Blatchford, J. W.

AU - Nalamasu, O.

PY - 2000

Y1 - 2000

N2 - A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

AB - A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

UR - https://www.scopus.com/pages/publications/0033699229

UR - https://www.scopus.com/pages/publications/0033699229#tab=citedBy

U2 - 10.1117/12.389015

DO - 10.1117/12.389015

M3 - Conference article

AN - SCOPUS:0033699229

SN - 0277-786X

VL - 4000 (I)

SP - 266

EP - 270

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Optical Microlithography XIII

Y2 - 1 March 2000 through 3 March 2000

ER -

High density lithography using attenuated phase shift mask and negative resist

Abstract

ASJC Scopus subject areas

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