High density lithography using attenuated phase shift mask and negative resist

S. Pau; R. Cirelli; K. Bolan; A. G. Timko; J. Frackoviak; G. P. Watson; L. E. Trimble; J. W. Blatchford; O. Nalamasu

doi:10.1117/12.389015

High density lithography using attenuated phase shift mask and negative resist

S. Pau, R. Cirelli, K. Bolan, A. G. Timko, J. Frackoviak, G. P. Watson, L. E. Trimble, J. W. Blatchford, O. Nalamasu

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

Original language	English (US)
Pages (from-to)	266-270
Number of pages	5
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4000 (I)
DOIs	https://doi.org/10.1117/12.389015
State	Published - 2000
Externally published	Yes
Event	Optical Microlithography XIII - Santa Clara, CA, USA Duration: Mar 1 2000 → Mar 3 2000

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.389015

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title = "High density lithography using attenuated phase shift mask and negative resist",

abstract = "A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.",

author = "S. Pau and R. Cirelli and K. Bolan and Timko, {A. G.} and J. Frackoviak and Watson, {G. P.} and Trimble, {L. E.} and Blatchford, {J. W.} and O. Nalamasu",

year = "2000",

doi = "10.1117/12.389015",

language = "English (US)",

volume = "4000 (I)",

pages = "266--270",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Optical Microlithography XIII ; Conference date: 01-03-2000 Through 03-03-2000",

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TY - JOUR

T1 - High density lithography using attenuated phase shift mask and negative resist

AU - Pau, S.

AU - Cirelli, R.

AU - Bolan, K.

AU - Timko, A. G.

AU - Frackoviak, J.

AU - Watson, G. P.

AU - Trimble, L. E.

AU - Blatchford, J. W.

AU - Nalamasu, O.

PY - 2000

Y1 - 2000

N2 - A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

AB - A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

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U2 - 10.1117/12.389015

DO - 10.1117/12.389015

M3 - Conference article

AN - SCOPUS:0033699229

SN - 0277-786X

VL - 4000 (I)

SP - 266

EP - 270

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Optical Microlithography XIII

Y2 - 1 March 2000 through 3 March 2000

ER -

High density lithography using attenuated phase shift mask and negative resist

Abstract

ASJC Scopus subject areas

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