GaP-on-insulator as a platform for integrated photonics

Simon Hönl; Katharina Schneider; Pol Welter; Yannick Baumgartner; Herwig Hahn; Lukas Czornomaz; Dalziel J. Wilson; Paul Seidler

doi:10.1364/CLEO_SI.2018.STh3I.6

GaP-on-insulator as a platform for integrated photonics

Simon Hönl, Katharina Schneider, Pol Welter, Yannick Baumgartner, Herwig Hahn, Lukas Czornomaz, Dalziel J. Wilson, Paul Seidler

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We present a complete process flow for fabrication of integrated GaP-on-insulator photonic devices via direct wafer bonding of epitaxial films. High-fidelity patterning enables a range of applications, such as waveguide resonators and photonic crystal cavities.

Original language	English (US)
Title of host publication	CLEO
Subtitle of host publication	Science and Innovations, CLEO_SI 2018
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580422
DOIs	https://doi.org/10.1364/CLEO_SI.2018.STh3I.6
State	Published - 2018
Externally published	Yes
Event	CLEO: Science and Innovations, CLEO_SI 2018 - San Jose, United States Duration: May 13 2018 → May 18 2018

Publication series

Name	Optics InfoBase Conference Papers
Volume	Part F94-CLEO_SI 2018
ISSN (Electronic)	2162-2701

Other

Other	CLEO: Science and Innovations, CLEO_SI 2018
Country/Territory	United States
City	San Jose
Period	5/13/18 → 5/18/18

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

Access to Document

10.1364/CLEO_SI.2018.STh3I.6

Cite this

Hönl, S., Schneider, K., Welter, P., Baumgartner, Y., Hahn, H., Czornomaz, L., Wilson, D. J., & Seidler, P. (2018). GaP-on-insulator as a platform for integrated photonics. In CLEO: Science and Innovations, CLEO_SI 2018 (Optics InfoBase Conference Papers; Vol. Part F94-CLEO_SI 2018). Optica Publishing Group (formerly OSA). https://doi.org/10.1364/CLEO_SI.2018.STh3I.6

Hönl, S, Schneider, K, Welter, P, Baumgartner, Y, Hahn, H, Czornomaz, L, Wilson, DJ & Seidler, P 2018, GaP-on-insulator as a platform for integrated photonics. in CLEO: Science and Innovations, CLEO_SI 2018. Optics InfoBase Conference Papers, vol. Part F94-CLEO_SI 2018, Optica Publishing Group (formerly OSA), CLEO: Science and Innovations, CLEO_SI 2018, San Jose, United States, 5/13/18. https://doi.org/10.1364/CLEO_SI.2018.STh3I.6

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abstract = "We present a complete process flow for fabrication of integrated GaP-on-insulator photonic devices via direct wafer bonding of epitaxial films. High-fidelity patterning enables a range of applications, such as waveguide resonators and photonic crystal cavities.",

author = "Simon H{\"o}nl and Katharina Schneider and Pol Welter and Yannick Baumgartner and Herwig Hahn and Lukas Czornomaz and Wilson, {Dalziel J.} and Paul Seidler",

note = "Publisher Copyright: {\textcopyright} OSA 2018.; CLEO: Science and Innovations, CLEO_SI 2018 ; Conference date: 13-05-2018 Through 18-05-2018",

year = "2018",

doi = "10.1364/CLEO_SI.2018.STh3I.6",

language = "English (US)",

isbn = "9781943580422",

series = "Optics InfoBase Conference Papers",

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AU - Hönl, Simon

AU - Schneider, Katharina

AU - Welter, Pol

AU - Baumgartner, Yannick

AU - Hahn, Herwig

AU - Czornomaz, Lukas

AU - Wilson, Dalziel J.

AU - Seidler, Paul

PY - 2018

Y1 - 2018

N2 - We present a complete process flow for fabrication of integrated GaP-on-insulator photonic devices via direct wafer bonding of epitaxial films. High-fidelity patterning enables a range of applications, such as waveguide resonators and photonic crystal cavities.

AB - We present a complete process flow for fabrication of integrated GaP-on-insulator photonic devices via direct wafer bonding of epitaxial films. High-fidelity patterning enables a range of applications, such as waveguide resonators and photonic crystal cavities.

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U2 - 10.1364/CLEO_SI.2018.STh3I.6

DO - 10.1364/CLEO_SI.2018.STh3I.6

M3 - Conference contribution

AN - SCOPUS:85048991719

SN - 9781943580422

T3 - Optics InfoBase Conference Papers

BT - CLEO

PB - Optica Publishing Group (formerly OSA)

T2 - CLEO: Science and Innovations, CLEO_SI 2018

Y2 - 13 May 2018 through 18 May 2018

ER -

GaP-on-insulator as a platform for integrated photonics

Abstract

Publication series

Other

ASJC Scopus subject areas

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