Abstract
A study was conducted to directly measure the rate of rinse process and chemical removal from structures on typical patterned waters. Results indicate that the reduction of water usage during rise needs to be optimized to achieve the best results for the overall water and energy conservation strategy.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 189-190 |
| Number of pages | 2 |
| Journal | Diffusion and Defect Data Pt.B: Solid State Phenomena |
| Volume | 76-77 |
| State | Published - 2000 |
| Event | 5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium Duration: Sep 18 2000 → Sep 20 2000 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Materials Science
- Condensed Matter Physics
- Physics and Astronomy (miscellaneous)