Focused beam scatterometry for deep subwavelength metrology

Thomas G. Brown; Miguel A. Alonso; Anthony Vella; Michael J. Theisen; Stephen T. Head; Steven R. Gillmer; Jonathan D. Ellis

doi:10.1117/12.2045651

Focused beam scatterometry for deep subwavelength metrology

Thomas G. Brown, Miguel A. Alonso, Anthony Vella, Michael J. Theisen, Stephen T. Head, Steven R. Gillmer, Jonathan D. Ellis

Optical Sciences, College of

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

12 Scopus citations

Abstract

It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

Original language	English (US)
Title of host publication	Three-Dimensional and Multidimensional Microscopy
Subtitle of host publication	Image Acquisition and Processing XXI
Publisher	SPIE
ISBN (Print)	9780819498625
DOIs	https://doi.org/10.1117/12.2045651
State	Published - 2014
Event	Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI - San Francisco, CA, United States Duration: Feb 3 2014 → Feb 6 2014

Publication series

Name	Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume	8949
ISSN (Print)	1605-7422

Conference

Conference	Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI
Country/Territory	United States
City	San Francisco, CA
Period	2/3/14 → 2/6/14

Keywords

Microscopy
Polarization Control
Pupil Engineering
Spatial Light Modulators

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Biomaterials
Radiology Nuclear Medicine and imaging

Access to Document

10.1117/12.2045651

Cite this

Brown, T. G., Alonso, M. A., Vella, A., Theisen, M. J., Head, S. T., Gillmer, S. R., & Ellis, J. D. (2014). Focused beam scatterometry for deep subwavelength metrology. In Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI Article 89490Y (Progress in Biomedical Optics and Imaging - Proceedings of SPIE; Vol. 8949). SPIE. https://doi.org/10.1117/12.2045651

Focused beam scatterometry for deep subwavelength metrology. / Brown, Thomas G.; Alonso, Miguel A.; Vella, Anthony et al.
Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI. SPIE, 2014. 89490Y (Progress in Biomedical Optics and Imaging - Proceedings of SPIE; Vol. 8949).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Brown, TG, Alonso, MA, Vella, A, Theisen, MJ, Head, ST, Gillmer, SR & Ellis, JD 2014, Focused beam scatterometry for deep subwavelength metrology. in Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI., 89490Y, Progress in Biomedical Optics and Imaging - Proceedings of SPIE, vol. 8949, SPIE, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI, San Francisco, CA, United States, 2/3/14. https://doi.org/10.1117/12.2045651

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abstract = "It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.",

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AU - Gillmer, Steven R.

AU - Ellis, Jonathan D.

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KW - Polarization Control

KW - Pupil Engineering

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ER -

Focused beam scatterometry for deep subwavelength metrology

Abstract

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Keywords

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