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Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scanner

  • J. R. Wendt
  • , T. W. Krygowski
  • , G. A. Vawter
  • , O. Blum
  • , W. C. Sweatt
  • , M. E. Warren
  • , D. Reyes

Research output: Contribution to journalConference articlepeer-review

Abstract

A multilevel diffractive optical element (DOE) was microfabricated onto a microelectromechanical system (MEMS) in an integrated compact optical MEMS laser scanner. Electron beam lithography was used to pattern and reactive-ion-beam etching was used to etch the microlens. This experiment was believed to be a significant step to achieve a wide range of integrated microsystems.

Original languageEnglish (US)
Pages (from-to)3608-3611
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number6
DOIs
StatePublished - Nov 2000
Externally publishedYes
Event44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA
Duration: May 30 2000Jun 2 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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