Abstract
A multilevel diffractive optical element (DOE) was microfabricated onto a microelectromechanical system (MEMS) in an integrated compact optical MEMS laser scanner. Electron beam lithography was used to pattern and reactive-ion-beam etching was used to etch the microlens. This experiment was believed to be a significant step to achieve a wide range of integrated microsystems.
Original language | English (US) |
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Pages (from-to) | 3608-3611 |
Number of pages | 4 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 18 |
Issue number | 6 |
DOIs | |
State | Published - Nov 2000 |
Externally published | Yes |
Event | 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: May 30 2000 → Jun 2 2000 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering