Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scanner

J. R. Wendt, T. W. Krygowski, G. A. Vawter, O. Blum, W. C. Sweatt, M. E. Warren, D. Reyes

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

A multilevel diffractive optical element (DOE) was microfabricated onto a microelectromechanical system (MEMS) in an integrated compact optical MEMS laser scanner. Electron beam lithography was used to pattern and reactive-ion-beam etching was used to etch the microlens. This experiment was believed to be a significant step to achieve a wide range of integrated microsystems.

Original languageEnglish (US)
Pages (from-to)3608-3611
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume18
Issue number6
DOIs
StatePublished - Nov 2000
Externally publishedYes
Event44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA
Duration: May 30 2000Jun 2 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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