Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching

M. Fallahi; C. Wu; C. Maritan; K. Fox; C. Blaauw

doi:10.1109/LEOSST.1991.638990

Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching

M. Fallahi, C. Wu, C. Maritan, K. Fox, C. Blaauw

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

4 Scopus citations

Abstract

We demonstrate the possibility of fabricating second and first-order circular gratings on InGaAsP/InP waveguides by electron beam (E-beam) lithography of a single PMMA resist layer and two-step reactive ion etching (RIE).

Original language	English (US)
Title of host publication	1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	14-15
Number of pages	2
ISBN (Electronic)	0879426187
DOIs	https://doi.org/10.1109/LEOSST.1991.638990
State	Published - 1991
Externally published	Yes
Event	1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991 - Newport Beach, United States Duration: Jul 29 1991 → Jul 31 1991

Publication series

Name	LEOS Summer Topical Meeting
Volume	1991-July
ISSN (Print)	1099-4742

Conference

Conference	1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991
Country/Territory	United States
City	Newport Beach
Period	7/29/91 → 7/31/91

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1109/LEOSST.1991.638990

Cite this

Fallahi, M., Wu, C., Maritan, C., Fox, K., & Blaauw, C. (1991). Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching. In 1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991 (pp. 14-15). Article 638990 (LEOS Summer Topical Meeting; Vol. 1991-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/LEOSST.1991.638990

Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching. / Fallahi, M.; Wu, C.; Maritan, C. et al.
1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991. Institute of Electrical and Electronics Engineers Inc., 1991. p. 14-15 638990 (LEOS Summer Topical Meeting; Vol. 1991-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Fallahi, M, Wu, C, Maritan, C, Fox, K & Blaauw, C 1991, Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching. in 1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991., 638990, LEOS Summer Topical Meeting, vol. 1991-July, Institute of Electrical and Electronics Engineers Inc., pp. 14-15, 1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991, Newport Beach, United States, 7/29/91. https://doi.org/10.1109/LEOSST.1991.638990

Fallahi M, Wu C, Maritan C, Fox K, Blaauw C. Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching. In 1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991. Institute of Electrical and Electronics Engineers Inc. 1991. p. 14-15. 638990. (LEOS Summer Topical Meeting). doi: 10.1109/LEOSST.1991.638990

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abstract = "We demonstrate the possibility of fabricating second and first-order circular gratings on InGaAsP/InP waveguides by electron beam (E-beam) lithography of a single PMMA resist layer and two-step reactive ion etching (RIE).",

author = "M. Fallahi and C. Wu and C. Maritan and K. Fox and C. Blaauw",

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ER -

Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching

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